PHOTO MASK

What is a photo mask?

• Photo mask is a glass-based or quartz transparent plate with pattern used in the manufacturing of electronic components (semiconductor), printed circuit boards and MEMS.
• It is a plate for transferring the circuit patterns of electronic components and printed circuit boards by using the transfer technology called photolithography.

PHOTO MASK LINEUP

• FILM MASKCost effective FILM MASK
   
• GLASS MASKDimensional stabilty GLASS MASK
• CHROME MASKHigh-resolution CHROME MASK

Various photo masks are available with reliable quality and quick delivery.

Comparsion of Photo Masks

Substrate / Manufacturing standard

		Film mask	Glass mask	Chrome mask
Substrate standard	Substrate	Polyester	Soda lime glass	Soda lime glass Quartz glass
	Substrate thickness	175μm	1.8～5.0mm	1.0～5.0mm
	Emulsion	Silver halide gelatine emulsion	Silver halide gelatine emulsion	Low-Reflection Bilayer Chromium,Monolayer Chromium,Three Layer Chromium
	Emulsion thickness	7～8μm	5～6μｍ	100～125nm
	Size	～711×813mm	～711×813mm	～700×800mm
	Drawing area	～690×800mm	～680×780mm	～700×800mm
Manufacturing standard	Minimum line width	30μm	10μm～	1μm～
	Short dimension accuracy	±3μm～	±1μm～	±0.1μm～
	Long dimension accuracy	±20μm～	±3μm～	±0.5μm～

Comparsion of image quality （30μｍ）

	Film mask	Glass mask	Chrome mask
Image

Expansion ratio of substrates

		Polyester	Soda lime glass	Quartz glass
Temperature	Expansion ratio	0.001％	0.00085％	0.00006％
	In term of a meter	10.0μm/℃	8.5μm/℃	0.6μm/℃
Humidity	Expansion ratio	0.0015％	None	None
	In term of a meter	15.0μm/％	None	None