product Information


What is a photo mask?

  • Photo mask is a glass-based or quartz transparent plate with pattern used in the manufacturing of electronic components (semiconductor), printed circuit boards and MEMS.
  • It is a plate for transferring the circuit patterns of electronic components and printed circuit boards by using the transfer technology called photolithography.


Various photo masks are available with reliable quality and quick delivery.

Comparsion of Photo Masks

Substrate / Manufacturing standard

Film mask Glass mask Chrome mask
Substrate standard Substrate Polyester Soda lime glass Soda lime glass
Quartz glass
Substrate thickness 175μm 1.6~5.0mm 1.0~5.0mm
Emulsion Silver halide gelatine emulsion Silver halide gelatine emulsion Low-Reflection Bilayer Chromium,Monolayer Chromium,Three Layer Chromium
Emulsion thickness 7~8μm 5~6μm 90~110nm
Size ~711×813mm ~812.8×1379.22mm 76.2×76.2mm~
Drawing area ~690×800mm ~711.2×1277.62mm 75×75mm~
Manufacturing standard Minimum line width 30μm 20μm 2μm
Short dimension accuracy ±3μm~ ±1μm~ ±0.2μm~
Long dimension accuracy ±20μm~ ±3μm~ ±0.5μm~

Comparsion of image quality (30μm)

Film mask Glass mask Chrome mask
Image Film mask Glass mask Chrome mask

Expansion ratio of substrates

Polyester Soda lime glass Quartz glass
Temperature Expansion ratio 0.001% 0.00085% 0.00006%
In term of a meter 10.0μm/℃ 8.5μm/℃ 0.6μm/℃
Humidity Expansion ratio 0.0015% None None
In term of a meter 15.0μm/% None None
Inquiries and Information Request