CHROME MASK

What is a chrome mask?

The core of photo masks meeting for high-precision pattern.By selecting quartz glass as substrate, it is possible to stabilize the dimensions under the temperature changes during exposure.Corresponds to the minimum pattern width of 2μm.

Applications

MEMS、FPD（LCD/OLED）、WLP、Thin fime chip products etc.

Features

• No fringe, suitable for ultra high-resolution image-formation.
• By selecting quartz glass as substrate, it is possible to stabilize the dimensions under the temperature changes during exposure.
• Excellent transcription performance with its thin light-shielding film.
• Corresponds to the minimum pattern width of 1μm.

Application data format

Gerber(274D/274X) / DWG / DXF / GDS2/ODB++
*Highly sensitive data communication method is available, please contact us.

Options

• AP Coating (releasability of chromium surface added)
• Mask corresponding to electricity destruction

Substrate	Soda lime glass,Quartz glass
Size	～700ｘ800mm
Substrate thickness	1.0mm～5.0mm
Emulsion	Low-Reflection Bilayer Chromium,Monolayer Chromium,Three Layer Chromium
Emulsion thickness	100～125nm

Minimum line width	1μｍ～
Short dimension accuracy	±0.1μｍ～
Long dimension accuracy	±0.5μm～
Temperature variation rate	0.00085%(Soda lime glass) 0.00006%(Quartz glass)
Humidity variation rate	None